MKS RPS AX7695 Product Details
Product Overview
MKS RPS AX7695 is a remote plasma source produced by MKS Instruments and belongs to the R*evolution III series.This product is mainly used for surface treatment of wafers in semiconductor manufacturing processes to provide the required reactive gases to achieve specific process requirements.
Main Features
Integrated design:Integrates quartz vacuum chamber,RF power supply and all necessary controls into a compact unit for easy installation.
High purity plasma:Provides high purity atomic radicals for wafer surface reactions to achieve precise process control.
Flexible configuration:A variety of gas combinations and flow rates can be configured to meet different process requirements.
High reliability:Designed for high vacuum environments,it has high reliability.
Application areas
Semiconductor manufacturing:Used for wafer cleaning,thin film deposition,etching and other processes.
Microelectronic device manufacturing:Used to manufacture various microelectronic devices.
Technical parameters(typical values,specific parameters are subject to the actual product)
Gas type:oxygen,argon,etc.
Flow rate:0.5-6.0 slm
Working pressure:0.5-2.0 Torr
Output:free radical
