MKS RPS AX7695 Product Details
Product Overview
MKS RPS AX7695 is an integrated remote plasma source designed to provide clean,efficient atomic radicals for thin film processing in semiconductor manufacturing processes.It integrates a quartz vacuum chamber,RF power supply and all necessary controls into a compact,self-contained unit that can be directly mounted on the tool process chamber to provide the desired reaction on the wafer surface.
Main Features
Integrated design:Integrates multiple components into a compact unit,simplifying installation and operation.
High purity:Provides high-purity atomic radicals for thin film deposition,etching and other processes.
Flexible configuration:Can be flexibly configured according to different process requirements,such as gas type,flow rate,etc.
Easy to control:Provides a simple control interface for easy integration into automation systems.
Technical Specifications
Type:Remote Plasma Source
Ignition Gas:100%O2 or Ar,or 90%O2/10%N2
Process Gas:100%O2 up to 6.0 slm,or 90%O2/10%N2
Working Pressure:0.5-2.0 Torr 1.0-6.0 slm
Output:Up to 6 slm Radicals
Input:Plasma Switch,Power Setting
Applications
Semiconductor Manufacturing:Used in processes such as thin film deposition,etching,and surface cleaning.
Microelectronic Device Manufacturing:Used in the manufacture of various microelectronic devices.
Product Advantages
Improve process efficiency:Provide high-purity atomic radicals to accelerate the reaction process.
Improve product quality:Improve product consistency and reliability.
Reduce costs:Simplify system design and reduce maintenance costs.
